Photosensitive monomer, liquid crystal material having the...

Compositions – Liquid crystal compositions

Reexamination Certificate

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C252S299600, C252S299610, C252S299620, C252S299630, C427S488000, C548S524000, C560S076000, C430S020000, C428S001100

Reexamination Certificate

active

07820070

ABSTRACT:
A photosensitive monomer of formula.“L1”, “L2”, “L3”, “L4”, “L5”, “L6” are selected from hydrogen, fluorine, chlorine, cyano, alkyl, alkylcarbonyl, alkoxycarbonyl, and alkylcarbonyloxy having 1 to 7 carbon atoms, in which one or more hydrogen atoms may be substituted by fluorine or chlorine.“R1”, “R2”, “R3” and “R4” are selected from hydrogen, fluorine, chlorine, cyano, thiocyanato, pentafluoro sulfanyl, nitrite, straight-chained alkyl/branched alkyl, and a “Z-Sp-P” group. At least one of “R1”, “R2”, “R3” and “R4” is “Z-Sp-P” group. “Z” is selected from oxygen, sulfur, methyoxy, carbonyl, caroboxyl, carbamoyl, methylthio, ethenylcarbonyl, carbonylethenyl, and a single bond. “Sp” is selected from straight-chained alkyl or branched alkyl and a single bond. “P” comprises a polymerizable group.

REFERENCES:
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patent: 2003/0160210 (2003-08-01), Bremer et al.
patent: 2004/0011996 (2004-01-01), Klasen-Memmer et al.
patent: 2005/0116200 (2005-06-01), Nakanishi et al.
patent: 2005/0136196 (2005-06-01), Kataoka
patent: 2005/0264737 (2005-12-01), Kataoka et al.
patent: 2006/0202162 (2006-09-01), Lin et al.
patent: 2007/0014934 (2007-01-01), Goulding et al.
patent: 1475547 (2004-02-01), None

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