Photosensitive mixture containing an ester or amide of 1,2-napht

Details Photosensitive mixture containing an ester or amide of 1,2-napht Photosensitive mixture containing an ester or amide of 1,2-napht

1988-06-02

1993-07-06

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430191, 430192, 430193, G03F 7023, G03C 161

Patent

active

052253104

ABSTRACT:
The invention relates to a photosensitive mixture which essentially contains an ester or an amide of a 1,2-naphthoquinonediazide sulfonic or carboxylic acid as the photosensitive compound, a phenolic resin which is soluble in aqueous-alkaline solutions and insoluble in water as the binder, and an additional speed enhancer, which corresponds to the general formula ##STR1## where X denotes a single bond, CH.sub.2, SO.sub.2, S, CO, C(CH.sub.3).sub.2, CHCC1.sub.3 or ##STR2## Biphenyldiol-(4,4'), bis-(4-hydroxyphenyl)-ketone, 2,2-bis-(4-hydroxy-phenyl)-propane or bis-(4-hydroxyphenyl)-sulfone are described as suitable compounds. The mixture is employed as photosensitive layers in recording materials suitable for the production of printing forms.
The invention provides for an increased photospeed, without any disadvantages occurring in respect of the copying or printing behavior.

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English translation of Japanese Publication No. 50-150,047, published Jan. 17, 1984.
English Abstract of Japanese Pat. Pub. No. 60-150,047, Published Dec. 18, 1985, (Nishioka).
English Abstract of Japanese Pat. Pub. No. 58-203,434, Published Nov. 26, 1983, (Katsuragi).

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