Photosensitive member having an overcoat layer

Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product

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430 57, 430 85, G03G 514

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active

048015156

ABSTRACT:
A photosensitive member of the present invention comprises an electrically conductive substrate, a photoconductive layer and an overcoat layer.
The photoconductive layer comprises selenium-arsenic alloy layer, or selenium layer and selenium-tellurium layer formed in this order. The overcoat layer comprises amorphous carbon containing hydrogen and contains a kind of atom selected from the group consisting of halogen, oxygen and nitrogen.
The photosensitive member of this construction is harmless and excellent in electrophotographic characteristics inclusive of durability and surface hardness.

REFERENCES:
patent: 3956525 (1976-05-01), Yasuba
patent: 4366208 (1982-12-01), Akai et al.
patent: 4394425 (1983-07-01), Shimiza et al.
patent: 4430404 (1984-02-01), Hosoya et al.
patent: 4490450 (1984-12-01), Shimizu et al.
patent: 4559289 (1985-12-01), Sunagawa et al.
patent: 4634648 (1987-01-01), Jansen et al.
patent: 4675265 (1987-06-01), Kazami et al.
Journal of Applied Polymer Science, vol. 17, 1973.
"A C-nmr Investigation of Plasma Polymerized Ethane, Ethylene, and Acetylene", Dilks et al, Journal of Polymer Science, vol. 19, 1981.

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