Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product
Reexamination Certificate
2000-02-01
2002-04-02
Rodee, Christopher (Department: 1753)
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Radiation-sensitive composition or product
C430S066000
Reexamination Certificate
active
06365309
ABSTRACT:
This application is based on applicationt(s) No. Hei 11-023712 filed in Japan, the contents of which are hereby incorporated by reference.
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to an electrophotographic phototeceptor, more particularly, relates to the photosensitive member for electrophotography having an excellent mechanical strength and a high durability which can be adapted for a copying machine for a digital image.
2. Description of the Related Art
In the photosensitive member which has formerly been employed in the field of the electrophotography, it is a general technical matter to form a surface protective layer on a photosensitive layer formed on an electroconductive support in order to prevent an abrasion of the photosensitive layer caused by a cleaning member and the like as well as an injection of charge into the photosensitive layer. It has been known that silica is a preferred compound for the surface protective layer from the viewpoint of a durability, said silica being constituted by three-dimensional network of siloxane bond (Si—O—Si bond). However, in the case of the surface protective layer consisting of only silica, there are problems that cracks occur on the surface of said layer, and an adhesion to the photosensitive layer becomes worse, and an electrostatic property of the photosensitive layer is lowered [see, for example, Japanese Patent Publication (KOKAI) Nos. 51155/1986].
For this reason, the surface protective layers have been proposed which are prepared by coating a solution comprising a mixture of polymers, such as acrylic resin, urethane elastomer, polyamide or the like and an organosilane which is a raw material of silica (solution for protection the surface) on the photosensitive layer and then curing said mixture [see, for example, Japanese Patent Publication (KOKAI) Nos. 141365/1991, 263660/1989, 341551/1993 and 135577/1991, and U.S. Pat. No. 5,260,157]. However, in the cases of these surface protective layers, there are problems that a durability (especially abrasive resistance) because a denseness and a surface hardness of said layers are low as a layer. In addition, these surface protective layers bring about the problem that when a layer thickness becomes thick (about 5 &mgr;m), a sensitivity becomes low, and a residual voltage becomes high, and a fog and the like occur at the time of plate wearing.
SUMMARY OF THE INVENTION
The object of the present invention is to provide a photosensitive member for electrophotography having excellent durability and adhesion between the surface protective layer and the photosensitive layer.
Another object of the present invention is to provide a photosensitive member for electrophotography having excellent electrostatic properties, such as sensitivity, which does not bring about the problems concerning cracks and the like.
The present invention relates to a photosensitive member for electrophotography, comprising:
an electroconductive support,
a photosensitive layer, and
a surface protective layer comprising polysiloxane and silyl group-containing vinyl resin, and a production method thereof.
DETAILED DESCRIPTION OF THE INVENTION
The present invention relates to a photosensitive member for electrophotography wherein at least the photosensitive layer and the surface protective layer are laminated on the electroconductive support in this order, characterized in that said surface protective layer comprises at least polysiloxane and silyl group-containing vinyl resin.
The surface protective layer according the present invention comprises at least polysiloxane and silyl group-containing vinyl resin. Preferably, the surface protective layer comprises a polymer wherein polysiloxane and silyl group-containing vinyl resin are chemically bonded. In other words, in the surface protective layer, polysiloxane and silyl group-containing vinyl resin exist in a mixed state, and preferably, polysiloxane and silyl group-containing vinyl resin are chemically bonded.
In the surface protective layer of the photosensitive member according to the present invention, polysiloxane has the structure wherein plural siloxane bonds are interlinked, and preferably it has the structure wherein the siloxane bonds are three-dimensionally repeated. In particular, polysiloxane has preferably the polycondensed structure of the organosilane represented by the following general formula (I) [hereinafter referred to as organosilane (I)]:
(R
1
)
n
Si(OR
2
)
4−n
(I)
wherein R
1
is an organic group having C
1
-C
8
, R
2
is alkyl group having C
1
-C
5
or acyl group having C
1
-C
4
, and n is an integer of 0-2.
As the organic group having C
1
-C
8
, of R
1
in the general formula (I), the following groups are exemplified: alkyl group, such as methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group, sec-butyl group, t-butyl group, n-pentyl group, n-hexyl group, n-heptyl group, n-octyl group and the like, &ggr;-chloropropyl group, y-bromopropyl group, 3,3,3-trifluoropropyl group, &ggr;-glycidoxypropyl group, &ggr;-(meth)acryloxypropyl group, &ggr;-mercaptopropyl group, &ggr;-aminopropyl group, &ggr;-dimethylaminopropyl group, 2-(3,4-epoxycyclohexyl)ethyl group, vinyl group, phenyl group and the like.
As alkyl group having C
1
-C
5
of R
2
, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group, sec-butyl group, t-butyl group, n-pentyl group and the like are exemplified. As acyl group having C
1
-C
4
of R
2
, acetyl group, propionyl group, butylyl group and the like are exemplified.
In the present specification, the term of “(meth)acryl” means “acryl” or “methacryl”. For example, methyl(meth)acrylate means methylacrylate or methylmethacrylate.
As the organosilane (I), the following compounds are exemplified: alkoxysilanes, such as tetramethoxysilane, tetraethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, i-propyltrimethoxysilane, i-propyltriethoxysilane, &ggr;-chloropropyltrimethoxysilane, &ggr;-chloropropyltriethoxysilane., 3,3,3-trifluoropropylmethoxysilane, 3,3,3-trifluoro-propyltriethoxysilane, &ggr;-glycidoxypropyltrimethoxysilane, &ggr;-glycidoxypropyltriethoxysilane, &ggr;-methacryloxy-propyltrimethoxysilane, &ggr;-methacryloxypropyltriethoxysilane, &ggr;-mercaptopropyltrimethoxysilane, &ggr;-mercaptopropyl-triethoxysilane, 3,4-epoxycyclohexylethyltrimethoxysilane, 3,4-epoxycyclohexylethyltriethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, di-n-propyldimethoxysilane, di-n-propyldiethoxysilane, di-i-propyldimethoxysilane, di-i-propyldiethoxysilane, divinyldimethoxysilane, divinyldiethoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane and the like, acyloxysilanes, such as tetraacetoxysilane, methyltriacetoxysilane, ethyltriacetoxysilane, dimethyldiacetoxysilane, diethyldiacetoxysilane and the like. The preferred organosilanes are methyltrimethoxysilane, methyltriethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, tetramethoxysilane and tetraethoxysilane. The organosilane (I) may be used independently or may be used as a mixture of two or more of the organosilanes.
As the silyl group-containing vinyl resin which constitutes the surface protective layer of the photosensitive member according to the present invention, any silyl group-containing vinyl resin may be used, and the vinyl resins employed in the present invention are not restricted in particular. The publicly known vinyl resins may be used. Although the contents of silyl group are not restricted in particular, it is desirable to adjust said contents such that 1-40, preferably 2-25 of silyl groups exist per 100 of monomers which constitute the vinyl resin. When the contents of silyl group are too low, it is difficult to obtain the inventive effects accordin
Edo Teiko
Inagaki Keiichi
Sakamoto Mitsutoshi
Tokutake Shigeaki
McDermott & Will & Emery
Minolta Co. , Ltd.
Rodee Christopher
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