Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product
Patent
1982-03-08
1983-10-11
Kimlin, Edward C.
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Radiation-sensitive composition or product
427 74, 357 2, 2525011, H01L 4500, B05P 512
Patent
active
044093110
ABSTRACT:
A hydrogen containing amorphous silicon photoconductive layer exhibits infrared absorption peaks between wavenumber of 2000 cm.sup.-1 where Si-H bonds are predominant and wavenumber of 2090 cm.sup.-1 where Si-H.sub.2 bonds are predominant and has an absorption coefficient ratio of the peaks of 2090 cm.sup.-1 to 2000 cm.sup.-1 of about 0.2 to 1.7. Preferably, the photoconductive layer is formed by a glow discharge decomposition and may contain small amount of oxygen and 10 to 20,000 ppm of Group IIIA impurity of the Periodic Table.
REFERENCES:
patent: 4217374 (1980-08-01), Ovshinsky et al.
patent: 4226898 (1980-10-01), Ovshinsky et al.
patent: 4265991 (1981-05-01), Hirai et al.
patent: 4297392 (1981-10-01), Higashi et al.
patent: 4356246 (1982-10-01), Tabei et al.
"Structural Interpretation of the Vibrational Spectra of a-Si: H Alloys", G. Lucovsky et al., Physical Review B, vol. 19, No. 4, Nov. 15, 1979.
Kawamura Takao
Masazumi Yoshida
Cashion Merrell C.
Kawamura Takao
Kimlin Edward C.
Kyoto Ceramic Co., Ltd.
Minolta Camera Kabushiki Kaisha
LandOfFree
Photosensitive member does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive member, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive member will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1275750