Photosensitive member

Details Photosensitive member Photosensitive member

1983-03-07

1985-01-01

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

2525011, 357 2, 430 57, 430 60, 430 95, G03G 508, G03G 514, G03G 5024

Patent

active

044916264

ABSTRACT:
The invention disclosed relates to a photosensitive member having excellent photosensitivity characteristics in the visible light region as well as in the near infrared region. According to first embodiment of the invention, the photosensitive member comprises an electrically conductive substrate, an amorphous silicon-germanium photoconductive layer having a thickness of about 0.1 to 3 microns, and an amorphous silicon photoconductive layer of 5 to 30 micron thick formed on the amorphous silicon-germanium photoconductive layer. Second embodiment of the photosensitive member comprises a substrate, an amorphous silicon semiconductor layer of 5 to 100 micron thick and an amorphous silicon-germanium photoconductive layer formed on the amorphous silicon semiconductor layer.

REFERENCES:
patent: 3647427 (1972-03-01), Hanada et al.
patent: 3696262 (1972-10-01), Antypas
patent: 3719486 (1975-03-01), Goldman et al.
patent: 4147667 (1979-04-01), Chevallier et al.
patent: 4451546 (1984-05-01), Kawamura et al.

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