Radiation imagery chemistry: process – composition – or product th – Microcapsule – process – composition – or product
Patent
1986-12-18
1988-09-20
Shah, Mukund J.
Radiation imagery chemistry: process, composition, or product th
Microcapsule, process, composition, or product
430270, 430281, 430314, 430914, 430916, 430927, G03C 178, G03C 1495, G03C 168, G03C 171
Patent
active
047725303
ABSTRACT:
A photohardenable composition comprising a free radical addition polymerizable or crosslinkable compound and an ionic dye-counter ion compound, said compound being capable of absorbing actinic radiation and producing free radicals which initiate free radical polymerization or crosslinking of said compound; and photosensitive materials incorporating the same.
REFERENCES:
patent: 2875047 (1959-03-01), Oster
patent: 3099558 (1963-07-01), Levinos
patent: 3418118 (1968-04-01), Thommes et al.
patent: 3488269 (1970-01-01), Allen et al.
patent: 3495987 (1970-04-01), Moore
patent: 3531281 (1970-05-01), Rust
patent: 3547633 (1970-11-01), Rust
patent: 3558387 (1971-01-01), Bassemir et al.
patent: 3567453 (1971-11-01), Borden
patent: 3573922 (1971-10-01), Rust
patent: 3579339 (1971-09-01), Chang et al.
patent: 3615452 (1971-08-01), Cerwonka
patent: 3650927 (1972-07-01), Levinos
patent: 3708296 (1973-01-01), Schlesinger
patent: 3729313 (1973-11-01), Smith
patent: 3775130 (1973-11-01), Enomoto et al.
patent: 4001017 (1977-01-01), Baumann et al.
patent: 4026705 (1977-07-01), Crivello et al.
patent: 4264703 (1981-08-01), Crivello
patent: 4272589 (1981-09-01), Dubois et al.
patent: 4307182 (1981-09-01), Dalzell et al.
patent: 4318766 (1982-03-01), Smith et al.
patent: 4343891 (1982-10-01), Aasen et al.
patent: 4394403 (1983-10-01), Smith
patent: 4399209 (1983-11-01), Sanders et al.
patent: 4405394 (1983-09-01), Cohen
patent: 4450227 (1984-12-01), Holmes et al.
patent: 4587194 (1986-05-01), Adair et al.
patent: 4588664 (1986-10-01), Fielding et al.
Eaton, "Dye Sensitized Photopolymerization", Advances in Photochem., vol. 13, pp. 427-487.
Kavarnos et al., "Photosensitization by Reversible Electron Transfer: Theories, Experimental Evidence, and Examples", Chem. Rev., 1986, 86, 401.449.
Chaberek et al., "Dye-Sensitized Photopolymerization Process Kinetics and Mechanism", J. Phys. Chem., 1965, 69, 2842-2848.
Eaton, "Electron Transfer of Induced Photofragmentation as a Route to Free Radicals", Pure and Applied Chem., 56, No. 9, pp. 1191-1202, 1984.
Margerum et al., "Studies on the Mechanism of Dye-Sensitized Photopolymerization Initiation, pp. 634-644.
Nagabhushaman, "Dye-Sensitized Photopolymerization of Vinyl Monomers in the Presence of Ascorbic Acid", g. of Polym. Sci., 10, 1511-1528, 1972.
Neumann, "The Photoreduction of Methylene Blue by Arylaminomethane-Sulfonates", Photochem. and Photobio., 39, No. 1, pp. 31-36, 1984.
Foote, "Mechanism of Photosensitized Oxidation", Science, 29 Nov. 1968, vol. 162, No. 3857, pp. 963-970.
Davidson et al., "Photosensitized Oxidation of Amines", j. c. s. Perkin II, pp. 169-181.
Sugawara, "Holographic Recording by Dye-Sensitized Photopolymerization of Acrylamide", Applied Optics, vol. 14, No. 2, Feb. 1975, pp. 378-382.
Ketley, "Dye-Sensitized Photopolymerization-AR Review", j. rad. cur.
Allen et al., "Effect of Viscosity on Dye-Sensitized Free Radical Photopolymerization Processes", P, S and E, vol. 9, pp. 148-153.
Margerum, "Photopolymerization Mechanisms", J. Phys. Chem., vol. 75, No. 20, 1971, pp. 3066-3074.
Chang et al., "Color Print Systems Based on Dispersion Photopolymerization", Photographic Sci. and Eng., vol. 13, No. 2, pp. 84, 89 (1969).
J.C.S. Chem. Comm., 1971, "Xanthane-Dye Photo-Sensitized Decomposition of a Diazonium Salt", by Patricia E. Macrae and Terry R. Wright.
Gottschalk Peter
Neckers Douglas C.
Schuster Gary B.
Shah Mukund J.
The Mead Corporation
LandOfFree
Photosensitive materials containing ionic dye compounds as initi does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive materials containing ionic dye compounds as initi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive materials containing ionic dye compounds as initi will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1748154