Photosensitive material processing apparatus

Details Photosensitive material processing apparatus Photosensitive material processing apparatus

2005-06-28

2005-06-28

Rutledge, D. (Department: 2851)

Photography

Fluid-treating apparatus

Dark cabinet

C396S604000, C396S606000, C396S626000

Reexamination Certificate

active

06910815

ABSTRACT:
The present invention provides a photosensitive material processing apparatus in which a photosensitive material is processed with a processing solution. Reliable liquid displacement in the vicinity of the surface of a photosensitive material, and uniform temperature adjustment can be performed. Also, damage or a transport deficiency, caused by a corner of the material coming into a through hole when a conveyance path of the photosensitive material is formed can be prevented. When pre-washing processing is carried out prior to development processing using a developer, processing unevenness in which an overcoat layer partially remains can be prevented. An operation of mounting and removing conveyance rollers disposed in a pair is facilitated and a proper nipping force can be imparted between a conveyance roller pair. Mounting of a replenisher case filled with a replenisher is facilitated and a replenisher is kept from remaining in piping or in a replenisher case.

REFERENCES:
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patent: 5568220 (1996-10-01), Joos et al.
patent: 5845169 (1998-12-01), Patton et al.
patent: 6604869 (2003-08-01), Davis et al.
Verlinden et al., Method of Supplying Processing Liquid to a Photographic Procssing Machine and Removing Waste Liquid Therefrom, Reserch Disclosure 408110, Apr. 1998, pp. 425-428.

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