Photosensitive material having a silicon-containing polymer

Details Photosensitive material having a silicon-containing polymer Photosensitive material having a silicon-containing polymer

1992-09-28

1994-03-01

Marquis, Melvyn I.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From silicon reactant having at least one...

528 16, 528 23, 528 37, 528 42, 528 43, C08G 7712

Patent

active

052908992

ABSTRACT:
A silicon-containing polymer comprising repeating units of silicon-containing cyclic compound, represented by a general formula (I) ##STR1## (wherein m and n are zero or a positive integer, respectively, however m+n>0, and X is any of an alkyl group, alkoxy group, phenyl group, naphthyl group, substituted phenyl group and substituted naphthyl group or a mixture of these, and the substituent of said substituted phenyl group or substituted naphthyl group indicates any of halogen atom, halogenated alkyl group, amino group, aminoalkyl group and nitro group or a mixture of these), and a photosensitive material containing said silicon-containing polymer are disclosed.

REFERENCES:
patent: 2386466 (1945-10-01), Hyde
patent: 3297632 (1967-01-01), Wu
patent: 4069178 (1978-01-01), Mikami et al.

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