Photosensitive material exposure apparatus

Details Photosensitive material exposure apparatus Photosensitive material exposure apparatus

1993-12-23

1995-05-09

Hayes, Monroe H.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 80, 359 55, 359 58, G03B 2772

Patent

active

054144906

ABSTRACT:
To provide a photosensitive material exposure apparatus which is easy for soft focusing exposure. A liquid crystal light regulation member 72 capable of holding light transmission and scattering functions reversibly is disposed between a light source 54 and paper 12. Original image light from a negative film 10 is made to pass through the liquid crystal light regulation member 72, so that the paper 12 is exposed to the light which has passed through the liquid crystal light regulation member 72. The relation of haze (%) with the ratio B/A of the distance B between the liquid crystal light regulation member 72 and the paper 12 to the distance A between the negative film 10 and the paper 12 is represented by B/A<0.3-0.0025 H, preferably, B/A<0.3-0.0029 H. The light transmission and scattering functions can be held wholly or partly or for every pixel by controlling current conduction to electrodes, so that the liquid crystal light regulation member 72 can be made to serve as a soft focusing filter. A photosensitive material can be subjected to soft focusing exposure easily by electric controlling without mechanical motion.

REFERENCES:
patent: 4025191 (1977-05-01), Seward
patent: 4745433 (1988-05-01), Fujimora et al.
patent: 4927242 (1990-05-01), Aoki et al.
patent: 5105215 (1992-04-01), Liu
patent: 5274484 (1993-12-01), Mochizuki et al.
patent: 5353140 (1994-10-01), Yamazaki et al.

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