Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product
Patent
1995-05-26
1999-03-02
Nuzzolillo, Maria
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Radiation-sensitive composition or product
430 72, 430 78, 430 96, 430135, G03G 500, G03G 1506
Patent
active
058768912
ABSTRACT:
An alternating copolymer comprising a repeating unit of the formula:
REFERENCES:
patent: 3554744 (1971-01-01), Allan
patent: 4698295 (1987-10-01), Pfeifer et al.
patent: 5384649 (1995-01-01), Takimoto et al.
Patent Abstracts of Japan, vol. 13, No. 93 (P-838) (3441) Mar. 6, 1989.
Patent Abstracts of Japan, vol. 8, No. 257 (P-316) (1694) Nov. 24, 1984.
World Patents Index, Week 8726, Derwent Publications, AN 87-181570.
World Patents Index, Week 8818, Derwent Publications, AN 88-123712.
Asayama Junko
Ogawa Hisahito
Sato Shigehiro
Takimoto Akio
Tanaka Eiichiro
Matsushita Electric - Industrial Co., Ltd.
Nuzzolillo Maria
Weiner Laura
LandOfFree
Photosensitive material and process for the preparation thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive material and process for the preparation thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive material and process for the preparation thereof will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-421040