Photosensitive material and process for developing the same

Details Photosensitive material and process for developing the same Photosensitive material and process for developing the same

1981-04-29

1983-02-15

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Diazo-type process, i.e., producing dye image by reacting...

430145, 430157, 430176, 430292, 430294, 430326, G03C 160, G03C 534, G03C 518, G03F 708

Patent

active

043741932

ABSTRACT:
A positive-working photosensitive material and a process for developing the same are disclosed.
The positive-working photosensitive material is obtained by forming on a base material a layer of a photosensitive composition containing (A), 100 weight parts of a resin binder including a vinylic polymer compound having phenolic hydroxyl groups and (B), 3-30 weight parts of an aromatic diazonium salt having only a single diazo group.
The positive-working photosensitive material is developed by using an aqueous alkali solution.

REFERENCES:
patent: 2405523 (1946-08-01), Sease et al.
patent: 2551133 (1951-05-01), Jennings et al.
patent: 2937085 (1960-05-01), Seven et al.
patent: 3544317 (1970-12-01), Yonezawa
patent: 3778270 (1973-12-01), Roos
patent: 3847614 (1974-11-01), Mattor
patent: 4193797 (1980-03-01), Cohen et al.
patent: 4296193 (1981-10-01), Moriya et al.
Derwent Abstract, Abstract No. 00517T-AG, (W. Germany-#2130283, 12/1971).
English Translation Submitted with Paper No. 7 of Japanese Patent Publication 50-8658, 4/1975, Asano.

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