Photosensitive material and image forming method

Details Photosensitive material and image forming method Photosensitive material and image forming method

1991-08-19

1993-11-09

Martin, Roland

Radiation imagery chemistry: process, composition, or product th

Stripping process or element

Element

430286, 430255, G03C 1805

Patent

active

052601641

ABSTRACT:
A photosensitive material comprises a photosensitive and heat-developable element and a photopolymerizable element which are contained in the same layer. The photopolymerizable element comprises at least a polymerizable polymer precursor having a melting point of 35.degree. C. or more. The photosensitive material is exposed to light with at least one wavelength within the wavelength region of from 400 nm to 900 nm, heated at 60.degree. to 180.degree. C., and exposed to light with at least one wavelength within the wavelength region of from 250 to 700 nm, and thus an unexposed area in the photosensitive layer which is an area not exposed to light with at least one wavelength within the wavelength region of from 400 nm to 900 nm is polymerized.

REFERENCES:
patent: 3874947 (1975-04-01), Hagakawa et al.
patent: 4624910 (1986-11-01), Takeda
patent: 4629676 (1986-12-01), Hayakawa et al.
patent: 4649098 (1987-03-01), Takeda
patent: 4764451 (1988-08-01), Ishikawa
patent: 4824756 (1989-04-01), Nakamura

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