Radiation imagery chemistry: process – composition – or product th – Transfer procedure between image and image layer – image... – Image layer portion transfer and element therefor
Patent
1990-02-07
1991-11-12
Le, Hoa Van
Radiation imagery chemistry: process, composition, or product th
Transfer procedure between image and image layer, image...
Image layer portion transfer and element therefor
430138, 430200, 430202, 430253, 430254, 430617, G03C 172
Patent
active
050647440
ABSTRACT:
A photosensitive material comprises a photosensitive and heat-developable element and a photopolymerizable element which are contained in the same layer. The photopolymerizable element comprises at least a polymerizable polymer precursor having a melting point of 35.degree. C. or more. The photosensitive material is exposed to light with at least one wavelength within the wavelength region of from 400 nm to 900 nm, heated at 60.degree. to 180.degree. C., and exposed to light with at least one wavelength within the wavelength region of from 250 to 700 nm, and thus an unexposed area in the photosensitive layer which is an area not exposed to light with at least one wavelength within the wavelength region of from 400 nm to 900 nm is polymerized.
REFERENCES:
patent: 4624910 (1986-11-01), Takeda
patent: 4629676 (1986-12-01), Hayakawa et al.
patent: 4764451 (1988-08-01), Ishikawa
patent: 4824756 (1989-04-01), Nakamura
Arahara Kozo
Fukui Tetsuro
Fukumoto Hiroshi
Kagami Kenji
Katayama Masato
Canon Kabushiki Kaisha
Le Hoa Van
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