Photosensitive material

Details Photosensitive material Photosensitive material

1981-05-20

1984-01-03

Wong, Jr., Harry

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

20415914, 526243, 526244, 526246, 526247, 526248, 526253, C08F21418

Patent

active

044243251

ABSTRACT:
A copolymer comprising (a) a monomer having a C.sub.7 to C.sub.21 perfluoroalkyl or perfluoroalkenyl group at one end of the molecule and an ethylenically unsaturated group at the other end of the molecule, and (b) a monomer having a photosensitive group, e.g. an azidobenzoyloxy group, cinnamoyloxy group, benzoylphenyl group or .alpha.,.beta.-unsaturated ketone group. The copolymer has an excellent photosensitivity and excellent water and oil repellent properties, and is useful for various purposes, e.g. as a photosensitive material for dry offset printing plate or resist and as a photo-curable, water and oil repelling coating material.

REFERENCES:
patent: 3637614 (1972-01-01), Greenwood
patent: 3645989 (1972-02-01), Tandy
patent: 3882084 (1975-05-01), Tato et al.
patent: 4007043 (1977-02-01), Stolka et al.
patent: 4125672 (1978-11-01), Kakuchi et al.
patent: 4143225 (1979-03-01), Turner
patent: 4171417 (1979-10-01), Dixon
Kobunshi Ronbunshi, vol. 35, No. 5, pp. 331-337 (May 1978) Kenichi Koseki et al.
Kobunshi Ronbunshi, vol. 37, No. 4, pp. 235-241 (Apr. 1980) Kenichi Koseki et al.

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