Photosensitive lithographic plate with diazo resin underlayer an

Details Photosensitive lithographic plate with diazo resin underlayer an Photosensitive lithographic plate with diazo resin underlayer an

1984-05-09

1986-05-13

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430145, 430162, 430167, 430175, 430176, 430194, 430195, 430302, G03C 160, G03C 171, G03F 708

Patent

active

045886695

ABSTRACT:
A photosensitive lithographic plate comprising a hydrophilic substrate, a photosensitive diazo resin layer superposed on the substrate, and a layer of a photosensitive polyvinyl acetal resin containing an aromatic azide group in a side chain thereof and having an acid number of 10 to 100 and superposed on the diazo resin layer, and a method for the manufacture of this photosensitive lithographic plate.

REFERENCES:
patent: 3808004 (1974-04-01), Thomas et al.
patent: 3817757 (1974-06-01), Yabe et al.
patent: 4104072 (1978-08-01), Golda et al.
patent: 4123276 (1978-10-01), Kita et al.
patent: 4191573 (1980-03-01), Toyoma et al.
patent: 4263392 (1981-04-01), Jones
patent: 4413091 (1983-11-01), Iwasaki et al.

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