Photosensitive laminate

Radiation imagery chemistry: process – composition – or product th – Stripping process or element – Forming nonplanar image

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Details

430145, 430155, 430166, 430256, 430259, 430271, 430273, 430323, 430324, 430325, 430326, G03C 1112, G03C 500, G03F 726

Patent

active

045446199

ABSTRACT:
This invention relates to a light sensitive laminate comprising a light sensitive layer of photoresist, a support therefor, and an intermediate protective layer preferably of a light transmitting material disposed between said photoresist layer and said support. In use, the photoresist layer of the laminate is adhered to a base material and the support stripped therefrom, thereby leaving a composite comprising the base material, photoresist layer and intermediate protective layer disposed over said photoresist layer. The intermediate layer serves to protect the photoresist layer from damage such as by abrasion or otherwise during processing, thereby permitting storage of the so-formed composite prior to use. Since the intermediate layer may be of a light transmitting material, photoimaging may take place through the intermediate layer with the intermediate layer subsequently removed by contact with a solvent that is a non-solvent for those areas of photoresist left after development.

REFERENCES:
patent: 3402044 (1968-09-01), Steinhoff et al.
patent: 3458311 (1969-07-01), Alles
patent: 3492121 (1970-01-01), Yackel
patent: 3526504 (1970-09-01), Coleste
patent: 3573975 (1971-04-01), Dhaka et al.
patent: 3884693 (1975-05-01), Bauer et al.

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