Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1972-05-16
1985-07-23
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430143, 430145, 430158, 430160, 430162, 430166, 430167, 430256, 430258, 430259, 430262, 430263, 430271, 430272, 430273, 430323, 430324, G03C 152, G03C 190, G03F 726
Patent
active
045308969
ABSTRACT:
This invention relates to a light-sensitive laminate comprising a light-sensitive layer of photoresist, a support therefor, and an intermediate protective layer preferably of a light-transmitting material disposed between said photoresist layer and said support. In use, the photoresist layer of the laminate is adhered to a base material and the support stripped therefrom, thereby leaving a composite comprising the base material, photoresist layer and intermediate protective layer disposed over said photoresist layer. The intermediate layer serves to protect the photoresist layer from damage such as by abrasion or otherwise during processing, thereby permitting storage of the so-formed composite prior to use. Since the intermediate layer may be of a light-transmitting material, photo-imaging may take place through the intermediate layer with the intermediate layer subsequently removed by contact with a solvent that is a non-solvent for those areas of photoresist left after development.
REFERENCES:
patent: 3402044 (1968-09-01), Steinhoff et al.
patent: 3458311 (1969-07-01), Alles
patent: 3492121 (1970-01-01), Yackel
patent: 3526504 (1970-09-01), Celeste
patent: 3573975 (1971-04-01), Dhaka et al.
patent: 3884693 (1975-05-01), Bauer et al.
Christensen Carl W.
Isaacson Calvin
Bowers Jr. Charles L.
Goldberg Robert L.
Shipley Company Inc.
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