Fabric (woven – knitted – or nonwoven textile or cloth – etc.) – Coated or impregnated woven – knit – or nonwoven fabric which... – Coating or impregnation formed in situ
Patent
1996-12-23
1999-10-26
Nutter, Nathan M.
Fabric (woven, knitted, or nonwoven textile or cloth, etc.)
Coated or impregnated woven, knit, or nonwoven fabric which...
Coating or impregnation formed in situ
442 69, 442 70, 442164, 525180, 525183, C08G 7310, C08L 7908
Patent
active
059728078
ABSTRACT:
A film forming, photosensitive, heat-resistant resin composition including a varnish of a polyimide precursor having no photosensitivity in itself, a polymeriziable monomer or oligomer compatible with the varnish and capable of providing a high-heat-resistant polymer upon being polymerized, and a polymerization initiator for the monomer or oligomer. The resin composition is useful for the production of circuit substrates and semiconductor devices for high-density mounting, since it can effectively avoid a reduction of the layer thickness during film formation, and ensures a low cost production process. The pattern formation process using such a resin composition is also disclosed. The polymeric composite having a particles-in-matrix microstructure and the production process thereof are also disclosed.
REFERENCES:
patent: 4389504 (1983-06-01), St. Clair et al.
patent: 4395518 (1983-07-01), Giles, Jr. et al.
patent: 4416973 (1983-11-01), Goff
patent: 4987188 (1991-01-01), Furno et al.
patent: 5438105 (1995-08-01), Nagata
Mat. Res. Soc. Symp. Proc. vol. 264 pp. 37-50.
Horikoshi Eiji
Ito Takashi
Miyahara Shoichi
Sasaki Makoto
Tani Motaki
Fujitsu Limited
Nutter Nathan M.
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