Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1982-11-18
1985-06-11
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430138, 430155, 430168, 430169, 430175, 430176, 430190, 430192, 430195, 430197, 430270, 430271, 430274, 430281, 430289, 430338, 430905, 430909, 430910, G03C 154, G03C 160, G03C 176
Patent
active
045229104
ABSTRACT:
A novel photosensitive film structure comprises a generally continuous minor phase material and a generally discontinuous major phase material. The minor phase includes a photosensitive compound whose solubility relative to a selected solvent changes upon exposure to electrromagnetic radiation, while the major phase is not photosensitive nor soluble in the solvent. The two phases are uniformly interdispersed throughout the film structure. Imagewise exposure to electromagnetic radiation renders the film structure selectively permeable to the selected solvent, and, after development, the film structure exhibits the chemical and physical properties of the major phase material. The film structure finds varied application in the manufacture of graphic arts articles such as lithographi printing plates and photoresists.
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Bowers Jr. Charles L.
Napp Systems (USA) Inc.
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