Photosensitive etching composition

Details Photosensitive etching composition Photosensitive etching composition

1973-11-26

1976-01-27

Powell, William A.

Compositions

Etching or brightening compositions

96 36, 96 362, 96 88, 156 4, 156 15, C03C 1500, C09K 1300, G03C 500

Patent

active

039351173

ABSTRACT:
A method of forming patterns on a semiconductor element is disclosed comprising the steps of (a) depositing a coating of silicon nitride, borosilicate glass, or phosphosilicate glass on the surface of a semiconductor substrate, (b) applying a photosensitive etching solution layer to the coating and drying it, (c) irradiating the substrate with ultraviolet radiation through a photomask having a required pattern to decompose the photosensitive solution and etch the coating, and (d) removing the photosensitive solution, the decomposed material, and the reaction product of the decomposed material and the coating with an organic solvent. The photosensitive etching solution consists of a compound which may be decomposed by light to a material which etches the coating, or a compound obtained from the reaction between the photodecomposed material and other material in the solution which etches said coating.

REFERENCES:
patent: 3346384 (1967-10-01), Gaynor
patent: 3485630 (1969-12-01), Burgess et al.
patent: 3489564 (1970-01-01), Schaefer
patent: 3520684 (1970-07-01), Metlay et al.
patent: 3520685 (1970-07-01), Schaefer
patent: 3520687 (1970-07-01), Schaefer

Affiliated with

Also associated with

Rating

Photosensitive etching composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive etching composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive etching composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1810389