Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy
Patent
1974-02-12
1976-11-02
Bleutge, John C.
Chemistry: electrical and wave energy
Processes and products
Processes of treating materials by wave energy
96 351, 96115R, 20415916, 20415923, 260831, 260836, 260837R, 427 54, C08F 800, C08L 6302, C08L 6310, G03C 170
Patent
active
039896102
ABSTRACT:
A photosensitive resin composition consisting of, or comprising as the essential components, (A) a photo-polymerizable unsaturated compound having at least two terminal ethylene groups, (B) a sensitizer capable of initiating polymerization of the above unsaturated compound upon irradiation with active rays, (C) a compound containing at least two epoxy groups, and (D) a compound selected from the group consisting of dicyandiamide, p,p'-diaminodiphenyl compounds, polycarboxylic acids having at least two carboxyl groups, polycarboxylic anhydrides and mixtures of the polycarboxylic acids and the polycarboxlic anhydrides. The above photosensitive resin composition can give a protective film excellent in solvent resistance, chemical resistance, heat resistance and mechanical strengths, and hence, can be used in the production of printed circuit boards, precision-processing of metals and as materials for adhesives, paints, plastic relief and the like.
REFERENCES:
patent: 2637715 (1953-05-01), Ott
patent: 3301743 (1967-01-01), Fekete et al.
patent: 3551246 (1970-12-01), Bassemir et al.
patent: 3674545 (1972-07-01), Strolle
patent: 3707583 (1972-12-01), McKown
patent: 3793398 (1974-02-01), Hokamura
patent: 3806483 (1974-04-01), Juba et al.
Abo Masahiro
Hayashi Nobuyuki
Isobe Asao
Ogawa Ken
Tsukada Katsushige
Bleutge John C.
Hitachi Chemical Company Ltd.
Page Thurman K.
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