Photosensitive donor element assemblages and associated process

Radiation imagery chemistry: process – composition – or product th – Transfer procedure between image and image layer – image... – Imagewise heating – element or image receiving layers...

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430200, 4302131, 430945, 430964, G03C 500, G03C 802

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active

058404635

ABSTRACT:
Photosensitive donor elements, assemblages, and associated processes are described for use in a laser-induced thermal transfer process, said elements comprising in the order listed a support; a photohardenable layer comprising a binder, at least one photohardenable component, and an initiator; optionally a barrier layer; optionally a coversheet; at least one ejection layer comprising a first polymer having a decomposition temperature T.sub.1 ; at least one top layer having an outer surface and comprising (i) a second polymer having a decomposition temperature T.sub.2 and (ii) an imageable component. For photomask fabrication applications, the imageable component is preferably black. Assemblages made with these donor elements are useful for fabrication of photomasks on various photohardenable materials, including flexographic printing plates and photoresists. These photomasks most preferably are useful in creating a relief image with a photosensitive element, such as flexographic printing plate or a photoresist.

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