Photosensitive diazonium compound containing composition and art

Details Photosensitive diazonium compound containing composition and art Photosensitive diazonium compound containing composition and art

1976-09-14

1981-06-23

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430158, 430171, 430175, 430176, 430177, 430183, 430271, 430278, 430302, 430325, 430910, 430927, 430292, G03C 160, G03C 176, G03C 194

Patent

active

042751381

ABSTRACT:
A photosensitive composition is prepared comprising a diazonium compound and a polymer containing at least 50% by weight of the recurring unit represented by the following general formula (I): ##STR1## wherein R.sub.1 represents hydrogen atom or methyl group, R.sub.2 represents hydrogen atom or a methyl, ethyl or chloromethyl group and n is an integer of 1 to 10.

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