Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1998-02-06
2000-03-21
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, 430193, 534557, G03F 7023
Patent
active
060401079
ABSTRACT:
A photosensitive compound comprising at least one o-quinonediazide sulfonic acid ester of a phenolic compound, said esters selected from the group consisting of formula (II): ##STR1## wherein the photosensitive compound is used in a radiation sensitive composition and a process for forming a positive patterned image.
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Blakeney Andrew J.
Ferreira Lawrence
Jeffries, III Alfred T.
Medina Arturo N.
Naiini Ahmad A.
Chu John S.
Olin Microelectronic Chemicals, Inc.
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