Photosensitive diazo resins and resin compositions for lithograp

Details Photosensitive diazo resins and resin compositions for lithograp Photosensitive diazo resins and resin compositions for lithograp

1992-10-29

1994-05-03

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430176, 534561, 534563, G03F 7021

Patent

active

053087356

ABSTRACT:
Disclosed is a photosensitive diazo resin for lithographic printing represented by the formula: ##STR1## wherein X.sup.- is a counter anion, Y is a divalent bonding group selected from the group consisting of --NH--, --S-- and --O--, R.sub.1, R.sub.2 and R.sub.3 are groups which are independently selected from the group consisting of hydrogen, an alkyl group and an alkoxy group, R.sub.4 and R.sub.5 are groups which are independently selected from the group consisting of hydrogen, an alkyl group and a phenyl group, 1 and m are integers which satisfy the relation:

REFERENCES:
patent: 4220700 (1980-09-01), McGuckin et al.
patent: 4614701 (1986-09-01), Mori et al.

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