Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1992-11-02
1994-09-06
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430163, 430176, 430302, G03F 7021
Patent
active
053447395
ABSTRACT:
A photosensitive diazo resin-containing photosensitive resin composition for lithographic printing comprising a sensitizing dye having an anion group in a molecule as a counter ion of a diazonium group.
REFERENCES:
patent: 3778274 (1973-12-01), Inoue et al.
patent: 4486529 (1984-12-01), Jeffers et al.
patent: 4912013 (1990-03-01), Suzuki et al.
Kanda Kazunori
Lam Edward
Nanba Osamu
Bowers Jr. Charles L.
Nippon Paint Co. Ltd.
Young Christopher G.
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