Photosensitive diazo composition with graft copolymer for use in

Details Photosensitive diazo composition with graft copolymer for use in Photosensitive diazo composition with graft copolymer for use in

1977-08-25

1979-05-15

Bowers, Jr., Charles L.

Gas separation: apparatus

Electric field separation apparatus

Plural diverse electric fields

96 364, 96 86P, 96 91R, 96115R, 96 67, 1011283, G03C 154, G03C 160, G03C 176, G03F 712

Patent

active

041546148

ABSTRACT:
The photosensitive composition contains a water-soluble graft copolymer of a partially hydrolyzed polyvinyl acetate grafted with acrylonitrile and optionally another vinylic monomer, a polymeric emulsion and a diazo compound. This composition possesses high resistance to solvent, abrasion and moisture and a favorable water-dissolubility as well.

REFERENCES:
patent: 3100150 (1963-08-01), Chismor et al.
patent: 3174860 (1965-03-01), Sus et al.
patent: 3189451 (1965-06-01), Reichel
patent: 3246986 (1966-04-01), Borchers
patent: 3853561 (1974-12-01), Reichel et al.
patent: 3867147 (1975-02-01), Teuscher
patent: 3915707 (1975-10-01), Gesswein et al.
patent: 4019907 (1977-04-01), Tsunoda et al.
Chemical Abstracts, vol. 80, 1974, #64997q.
Chemical Abstracts, vol. 70, 1969, #48150w.
Chemical Abstracts, vol. 64, 1966, #8471d-e-f.

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