Photosensitive diazo coating compositions and plates

Details Photosensitive diazo coating compositions and plates Photosensitive diazo coating compositions and plates

1979-07-03

1981-08-04

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430302, 430331, 430157, G03C 160, G03C 171

Patent

active

042823013

ABSTRACT:
A photosensitive coating composition for printing plate comprises a mixture containing a copolymer, prepared by polymerizing from 10 to 70% by weight of a monomer (A) having the general formula: ##STR1## in which R.sub.1 and R.sub.2 are hydrogen atoms or alkyl groups having 1 or 2 carbon atoms, with from 90 to 30% by weight of at least one monomer (B) selected from the group consisting of methyl methacrylate, methacrylic acid, acrylonitrile, and 2-hydroxyethyl methacrylate together with a diazo resin; and, optionally, a dye; a pigment; and/or other additives.

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patent: 3418295 (1968-12-01), Schoenthaler
patent: 3652272 (1972-03-01), Thomas
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patent: 3841874 (1974-10-01), Nishino
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patent: 3902906 (1975-09-01), Iwama et al.
patent: 4123276 (1978-10-01), Kita et al.

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