Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1989-09-06
1990-09-11
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430175, 430176, 430271, 430273, G03F 7021, G03F 7027, G03C 176
Patent
active
049562614
ABSTRACT:
A photosensitive recording material with a layer base and a photosensitive layer, which essentially contains a diazonium salt polycondensation product, a polymeric binder which is insoluble in water and soluble in organic solvents and soluble or at least swellable in aqueous alkaline solutions, a polymerization initiator which forms free radicals when exposed to actinic radiation and a polymerizable ethylenically unsaturated compound containing at least one unsaturated group and having a boiling point at normal pressure of over 100.degree. C., wherein the recording material contains, between the photosensitive layer and the layer base, a photosensitive intermediate layer which essentially contains a diazonium salt polycondensation product and a polymeric binder which is insoluble in water and soluble in organic solvents and soluble or at least swellable in aqueous alkaline solutions.
REFERENCES:
patent: 3396019 (1968-08-01), Uhlig
patent: 3867147 (1975-02-01), Teuscher
patent: 3905815 (1975-09-01), Bonham
patent: 4171974 (1979-10-01), Golda et al.
patent: 4233390 (1980-11-01), Jargiello
patent: 4289838 (1981-09-01), Rowe et al.
patent: 4316949 (1982-02-01), Patrellis et al.
patent: 4387151 (1983-06-01), Bosse et al.
patent: 4631245 (1986-12-01), Pawlowski
patent: 4647475 (1987-03-01), Inukai et al.
patent: 4659645 (1987-04-01), Frommeld et al.
patent: 4687727 (1987-08-01), Toyoma et al.
patent: 4886731 (1989-12-01), Sypek et al.
Lehmann Peter
Pawlowski Georg
Bowers Jr. Charles L.
Hoechst Aktiengesellschaft
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