Photosensitive compounds, photosensitive resin compositions, and

Details Photosensitive compounds, photosensitive resin compositions, and Photosensitive compounds, photosensitive resin compositions, and

1998-05-13

2000-02-01

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Screen other than for cathode-ray tube

430 23, 430 28, 430167, 430195, 430196, 430197, 430325, 552 1, 552 8, G03F 900, G03F 7012

Patent

active

060200936

ABSTRACT:
The photosensitive compound of the present invention contains the following unit: ##STR1## and is particularly expressed by the following formula: ##STR2## Different photosensitive resin compositions can be prepared from this novel photosensitive resin compound, and the resulting photosensitive resin compositions do not raise the problem of environmental pollution, exhibit high resolution, possess a high level of sensitivity, and exhibit excellent adhesion with substrates, coating characteristics and storage stability.

REFERENCES:
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patent: 4792516 (1988-12-01), Oriumi et al.
patent: 4857428 (1989-08-01), Koike
patent: 5807657 (1998-09-01), Kikuchi et al.
patent: 5866296 (1999-02-01), Shibuya et al.
Database WP,I Section Ch. Week 9038, Derwent Publications Ltd. London, GB, Class A89, AN90-287901, JP 02 204 750.
Database WPI, Section Ch. Week 8473, Derwent Publications Ltd. London, GB, Class A89, An287-304344, JP 62 215 606.

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