Photosensitive compounds and lithographic composition or plate t

Details Photosensitive compounds and lithographic composition or plate t Photosensitive compounds and lithographic composition or plate t

1985-03-29

1987-02-03

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430141, 430166, 430189, 430192, 430193, 430302, 534556, 534557, 534561, 534563, 568818, G03C 154, C07C 3522, C07C11300

Patent

active

046408843

ABSTRACT:
Quinone diazide derivatives of adamantane, and especially quinone diazide derivatives of 1,3-dialkyl-5,7-bis(hydroyphenol) adamantanes, have been found to provide unique properties when coated on metal substrate in the preparation of both positive and negative working lithographic plates. The improved lithographic plates are characterized by enhanced speed, coating oleophilicity, alkali resistance, developer latitude and development speed.

REFERENCES:
patent: 3046113 (1962-07-01), Schmidt et al.
patent: 3342880 (1967-09-01), Reinhardt
patent: 3398165 (1968-08-01), Duling et al.
patent: 3494767 (1970-02-01), Laridon et al.
patent: 3567451 (1971-03-01), Borden et al.
patent: 3594427 (1971-07-01), Moore
patent: 3635709 (1972-01-01), Kobayashi
patent: 3637384 (1972-01-01), Deutsch et al.
patent: 3687663 (1972-08-01), Bloom
patent: 3802885 (1974-04-01), Lawson et al.
patent: 4522911 (1975-06-01), Clecak et al.

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