Photosensitive compositions with reaction product of novolak co-

Details Photosensitive compositions with reaction product of novolak co- Photosensitive compositions with reaction product of novolak co-

1980-03-14

1981-12-29

Bowers, Jr., Charles L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

430190, 430192, 430302, 430326, 528158, 528161, 528162, G03C 154, C08G 824

Patent

active

043083684

ABSTRACT:
Photosensitive compositions which contain as a photosensitive resin prepared by the condensation of the co-condensated novolak resin of the mixture of phenols such as in a combination of tert-butyl (or tert-octyl) phenol and phenol and/or cresol and formaldehyde, with o-quinonediazido sulfonic (or carboxylic) acid or contain said novolak resin as an additive for a photosensitive o-quinonediazido compound are discosed.

REFERENCES:
patent: 3647443 (1972-03-01), Rauner et al.
patent: 4123279 (1978-10-01), Kobayashi
patent: 4217407 (1980-08-01), Watanabe et al.
Dinaburg, M. S., "Photosensitive Diazo Cpds", Focal Press, 1964, p. 184 and 188.

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