Photosensitive compositions containing aromatic fused polycyclic

Details Photosensitive compositions containing aromatic fused polycyclic Photosensitive compositions containing aromatic fused polycyclic

1991-03-08

1992-05-26

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430192, 430193, G03F 7023, G03C 161

Patent

active

051167158

ABSTRACT:
A photosensitive composition having increased contrast and selectivity, useful in forming high resolution patterns. The composition comprises a phenolic resin, a diazoquinone compound and an aromatic fused polycyclic sulfonic or carboxylic acid, in the form of the free acid and/or an ammonium salt and/or an acid halide, the cation component of the ammonium salt having the formula ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4, each represent hydrogen, C.sub.1 -C.sub.4 -alkyl or C.sub.1 -C.sub.4 -hydroxyalkyl.
In forming a negative pattern, the composition is coated on a substrate and exposed imagewise to ultraviolet radiation, thereafter treated with a silicon compound, whereby the silicon compound is selectively absorbed into the irradiated portions and the nonirradiated portions are then removed by dry etching.

REFERENCES:
patent: 3046120 (1962-07-01), Schmidt et al.
patent: 3126281 (1964-03-01), Sus et al.
patent: 3269837 (1966-08-01), Sus
patent: 3745011 (1973-07-01), Hudgin
patent: 3969118 (1976-07-01), Stahlhofen et al.
patent: 4148654 (1979-04-01), Oddi
patent: 4307173 (1981-12-01), Gventer
patent: 4458000 (1984-07-01), Stahlhofen
patent: 4777111 (1988-10-01), Blumel et al.
patent: 4816380 (1989-03-01), Covington et al.
patent: 4847178 (1989-07-01), Komano
patent: 4929534 (1990-05-01), Stephani et al.
patent: 4997742 (1991-03-01), Covington et al.
Chemical Abstracts, vol. 83, p. 360, No. 211324k, 1975, (F. Endermann).
Chemical Abstracts, vol. 77, p. 430, No. 107738p, 1972 (H. A. Levine).
Noller, Carl R., "Textbook of Organic Chemistry", 2nd ed., W. Saunders & Co., pp. 573 and 584-587.
Hiraoka et al., IBM Technical Disclosure Bulletin, vol. 20, No. 5, Oct. 1977.
Konishiroku Photo Ind. Co. Ltd., Patent Abstracts of Japan, vol. 11, No. 79, Mar. 11, 1987, p. 26P55 JP-A-61 235 832.
Toray K. K., Patent Abstracts of Japan, vol. 8, No. 282, Dec. 22, 1984, p. 123 P 323 JP-A-59 148 060.

Affiliated with

Also associated with

Rating

Photosensitive compositions containing aromatic fused polycyclic does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive compositions containing aromatic fused polycyclic, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive compositions containing aromatic fused polycyclic will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-418921