Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1995-01-06
1996-12-31
Chu, John S. Y.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430 7, 430143, 430157, 430175, 430176, 4302781, 430293, 430302, 430308, G03F 7021, G03F 712, G03C 154, G03C 177
Patent
active
055893155
ABSTRACT:
A photosensitive composition containing a polyfunctional aromatic diazo compound having at least two groups of Formula (uD) in the molecule, and a photosensitive composition using the same. The diazo compound can be handled under visible light free from ultraviolet, is highly photosensitive, has good shelf life, and lithographic printing plates and screen printing plates formed with the same: ##STR1## wherein G.sup.1 is a substituent derived from alcoholic hydroxyl group; R.sup.1 and R.sup.2 are hydrogen, or alkyl or alkyloxy of 1 to 8 carbon atoms;
REFERENCES:
patent: 4284705 (1981-08-01), Phlipot et al.
patent: 5206349 (1993-04-01), Iida et al.
patent: 5430130 (1995-07-01), Iida et al.
Hozumi Ichiro
Iida Hirotada
Kuniyoshi Yasuo
Tochizawa Noriaki
Tokuda Katsuyo
Bierman Jordan B.
Chu John S. Y.
Toyo Gosei Kogyo Co. Ltd.
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