Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1996-05-17
1997-12-09
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430157, 430175, 430176, 4302731, 4302811, G03F 7021
Patent
active
056959052
ABSTRACT:
A photosensitive composition having a photoreactive component, selected from a diazonium polycondensation product or a free radical polymerizable system of photoinitiators and unsaturated compounds or a hybrid system and a binder formed by reacting a carboxyl group containing a polymer of formula
REFERENCES:
patent: 3372105 (1968-03-01), Johnson
patent: 3732106 (1973-05-01), Steppan et al.
patent: 4123276 (1978-10-01), Kwita et al.
patent: 4177073 (1979-12-01), Hata et al.
patent: 4304832 (1981-12-01), Ohta et al.
patent: 4355096 (1982-10-01), Walls
patent: 4387151 (1983-06-01), Bosse et al.
patent: 4511640 (1985-04-01), Liu
patent: 4618562 (1986-10-01), Walls et al.
patent: 4631245 (1986-12-01), Pawlowski
patent: 4687727 (1987-08-01), Toyama et al.
patent: 4731316 (1988-03-01), Tomiyasu et al.
patent: 4741985 (1988-05-01), Aoai et al.
patent: 4774161 (1988-09-01), Sekiya et al.
patent: 4840868 (1989-06-01), Pawlowski et al.
patent: 4877711 (1989-10-01), Aoai et al.
patent: 4940646 (1990-07-01), Pawlowski
patent: 4950582 (1990-08-01), Aoai et al.
patent: 4983491 (1991-01-01), Aoai et al.
patent: 5143813 (1992-09-01), Joerg
patent: 5169897 (1992-12-01), Walls
patent: 5176985 (1993-01-01), Seitz et al.
patent: 5187040 (1993-02-01), Mueller-Hess et al.
patent: 5206113 (1993-04-01), Mueller-Hess et al.
patent: 5219699 (1993-06-01), Walls et al.
patent: 5238772 (1993-08-01), Mueller-Hess et al.
patent: 5260161 (1993-11-01), Matsumura et al.
patent: 5352563 (1994-10-01), Kawasaki et al.
patent: 5376513 (1994-12-01), Mihayashi
patent: 5470930 (1995-11-01), Toba et al.
H. Baumann, H.J. Timpe, "Chemical Aspects of Offset Printing" in Journal pp. 377-389.
T. G. Gant and A. I. Meyers, "The Chemistry of 2-Oxazolines (1985-Present)" in Tetrahedron vol. 50, No. 8 (1994) pp. 2297-2360.
Baumann Harald
Dwars Udo
Savariar-Hauck Celin M.
Timpe Hans-Joachim
Persley Sidney
Sun Chemical Corporation
Young Christopher G.
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