Photosensitive compositions and lithographic printing plates con

Details Photosensitive compositions and lithographic printing plates con Photosensitive compositions and lithographic printing plates con

1991-07-30

1993-06-15

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430157, 430175, 430176, 430278, 430302, 430325, 430909, 525 61, G03F 7021, G03F 732, G03C 177

Patent

active

052196992

ABSTRACT:
Photosensitive compositions, useful in lithographic printing plates which can be developed with aqueous developing solutions, comprise a diazo resin and an acid-substituted ternary acetal polymer which functions as a polymeric binder. The acid-substituted ternary acetal polymers are comprised of recurring units which include three six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group, another of which is substituted with an aromatic or heterocyclic moiety, and a third of which is substituted with an acid group, an acid-substituted alkyl group or an acid-substituted aryl group.

REFERENCES:
patent: 4413091 (1983-11-01), Iwasaki et al.
patent: 4588669 (1986-05-01), Asano
patent: 4652604 (1987-03-01), Walls et al.
patent: 4707437 (1987-11-01), Walls et al.
patent: 4741985 (1988-05-01), Aoai et al.
patent: 4940646 (1990-07-01), Pawlowski

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