Photosensitive composition for use in an OPC comprising X-metal

Details Photosensitive composition for use in an OPC comprising X-metal Photosensitive composition for use in an OPC comprising X-metal

1993-01-05

1995-05-23

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 56, 430 57, 430 75, 430 76, G03G 500

Patent

active

054181011

ABSTRACT:
A composition of matter, useful in the production of organic photoconductor devices, comprising a dispersion of X-form metal-free phthalocyanine in an organic liquid containing an effective amount of a dispersant.

REFERENCES:
patent: 3972718 (1976-08-01), Weigl
patent: 4868086 (1989-09-01), Ohtani et al.
patent: 4921773 (1990-05-01), Melnyk et al.
Japanese Abstract, vol. 13, No. 269 (P-888)(3617) Jun. 21, 1989 and Japanese Abstract, JP-A-10 62 648, Mar. 9, 1989.

Affiliated with

Also associated with

Rating

Photosensitive composition for use in an OPC comprising X-metal does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive composition for use in an OPC comprising X-metal , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive composition for use in an OPC comprising X-metal will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2139724