Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1981-03-27
1983-06-14
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430167, 430194, 430313, 430323, 430325, 430908, 430927, G03C 171, G03C 170, G03C 160
Patent
active
043883974
ABSTRACT:
A novel photosensitive composition for dry development in the ultra-fine pattern formation of the semiconductor industry, which is composed of at least one of acrylic and vinyl ketone polymers and a specified subliming hisazide compound as a photocuring agent, is disclosed.
The use of the photosensitive composition provides a very effective ultra-fine pattern formation process in the semiconductor industry with such advantages that unexposed areas are selectively removable by treating with a plasma, and consequently plasma development becomes available so that high resolution may easily be obtained. Automating and dry processing of all the stages ranging from development processing to stripping processing become available when using the photosensitive composition of this invention. No expensive treating reagents are needed and environmental pollution is eliminated.
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Asano, T., Tokyo Symposium '77 on Photo and Electro-Imaging, Tokyo, pp. 241-248, 9/1977.
Bowers Jr. Charles L.
Tokyo Ohka Kogyo Kabushiki Kaisha
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