Radiation imagery chemistry: process – composition – or product th – Transfer procedure between image and image layer – image... – Diffusion transfer process – element – or identified image...
Patent
1994-01-12
1997-09-02
Rodee, Christopher D.
Radiation imagery chemistry: process, composition, or product th
Transfer procedure between image and image layer, image...
Diffusion transfer process, element, or identified image...
430253, 4302811, 430328, 430330, G03C 802
Patent
active
056630328
ABSTRACT:
A photosensitive material comprises a photosensitive composition comprising a photosensitive and heat-developable element and a photopolymerizable element. An imagewise unexposed area on the material is polymerized by imagewise exposure, heating and whole areal exposure. The photosensitive and heat-developable element comprises at least a photosensitive silver halide, an organic silver salt and a reducing agent of the formula ##STR1## The photopolymerizable element comprises at least a polymerizable polymer precursor and a photopolymerization initiator. An image forming method comprises the steps; subjecting a photosensitive material in the same layer to imagewise exposure and heating to form an image; and subjecting the resultant photosensitive material to whole areal exposure to polymerize and imagewise unexposed or exposed area thereof.
REFERENCES:
patent: 3667958 (1972-06-01), Evens
patent: 3751249 (1973-08-01), Hiller
patent: 3874947 (1975-04-01), Hayakawa et al.
patent: 4065315 (1977-12-01), Yamazaki et al.
patent: 4207108 (1980-06-01), Hiller
patent: 4558003 (1985-12-01), Sagawa
patent: 4624910 (1986-11-01), Takeda
patent: 4629676 (1986-12-01), Hayakawa
patent: 4649098 (1987-03-01), Takeda
patent: 4649103 (1987-03-01), Yabuki et al.
patent: 4753862 (1988-06-01), Sato et al.
patent: 4764451 (1988-08-01), Ishikawa
patent: 4783396 (1988-11-01), Nakamura et al.
patent: 4950584 (1990-08-01), Komamura et al.
patent: 5041369 (1991-08-01), Fukui et al.
Light Sensitive Systems, J. Kosar, John Wiley and Sons, Inc., NY, 1965 p. 170.
Chemical Abstracts 89:44310 (1978).
Arahara Kozo
Fukui Tetsuro
Fukumoto Hiroshi
Isaka Kazuo
Kagami Kenji
Canon Kabushiki Kaisha
Oriental Photo Industrial Co., Ltd.
Rodee Christopher D.
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