Photosensitive composition containing 1,2-naphthoquinone-2-diazi

Details Photosensitive composition containing 1,2-naphthoquinone-2-diazi Photosensitive composition containing 1,2-naphthoquinone-2-diazi

1992-03-24

1993-06-15

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430192, 430193, 430194, 430196, 430280, 430343, 430916, 430920, 430925, G03F 7023, G03C 161

Patent

active

052197000

ABSTRACT:
A photosensitive composition comprising (a) a 1,2-naphthoquinone-2-diazido-4-sulfonic acid ester compound, (b) alkali-soluble resin, (c) a halomethyloxadiazole compound which releases halogen free radicals by irradiation with actinic rays and (a) a dye which interacts withthe decomposition product of said halomethyloxydiazole compound and discolors or develops color. The composition exhibits excellent development latitude, light safety, visible-on-exposure characteristic and printing resistance.

REFERENCES:
patent: 3102809 (1963-09-01), Endermann et al.
patent: 4606995 (1986-08-01), Kita et al.
patent: 4738915 (1988-04-01), Komine et al.
patent: 4840869 (1989-06-01), Kita et al.
patent: 4845008 (1989-07-01), Nishioka et al.
patent: 4943511 (1990-07-01), Lazarus et al.
J. Kosar, "Light-Sensitive Systems," J. Wiley & Sons, 1965, pp. 339-352.

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