Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate
2001-10-05
2003-12-09
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
C430S165000, C430S166000, C430S191000, C430S193000, C430S302000
Reexamination Certificate
active
06660445
ABSTRACT:
BACKGROUND OF THE INVENTION
The present invention relates to a photosensitive composition which is utilized for preparation of a lithographic printing plate, an integrated circuit or a photomask. More specifically, the present invention relates to a presensitized plate useful for preparation of a lithographic printing plate that has wide development latitude, excellent coupling property, ball-point adaptability, sensitivity and stability as well as small change of sensitivity after long time, comprising photosensitive composition comprising a polymer compound being excellent in abrasion resistance and chemical resistance.
A photosensitive composition comprising o-naphthoquinonediazide compound and a novolak-type phenol resin has been industrially utilized for the preparation of lithographic printing plate or photoresist as a useful photosensitive composition.
However, the novolak-type phenol resin which is a main component of the photosensitive composition has many defects, e.g., poor adhesion to the substrate, brittleness of the film made of the resin, poor application property, poor abrasion resistance, and insufficient durability during printing process, when the composition is used for lithographic printing plate. Moreover, it shows poor chemical resistance and particularly when it is used with UV ink, the durability becomes insufficient.
In order to improve these properties, a presensitized plate is generally subjected to burning treatment (that is, to heat a plate after light exposure and development). However, such burning treatment causes another problem. That is, it causes contamination on prints obtained from such treated plate because low molecular compounds are sublimated from photosensitive layer of an image area during the burning treatment to adhere to a non-image area of the plate.
To solve the problem, a number of polymers are studied as a binder for the photosensitive composition. For example, it has been proposed to use polyhydroxystyrene or hydroxystyrene copolymer in Japanese Patent Publication for Opposition Purpose hereunder referred to as “J. P. KOKOKU”) No. Sho 52-41050. Some properties of the film made of the copolymer are certainly improved, but still it shows poor abrasion resistance and chemical resistance. Also, it has been proposed to use a polymer comprising a structural unit derived from acrylic acid in Japanese Patent Unexamined Publication (hereunder referred to as “J. P. KOKAI”) No. Sho 51-34711. But a lithographic printing plate using the polymer shows narrow latitude for developing condition and it also shows insufficient abrasion resistance. In addition, it has been proposed to use the following compounds as a binder; a polymer comprising a sulfonamide group in J. P. KOKAI No. Hei 2-866, polymers comprising a group derived from acrylic acid with phenolic hydroxy group in J. P. KOKAI Nos. Sho 63-89864, Hei 1-35436, Hei 1-52139, and Hei 8-339082. However, abrasion resistance of the lithographic printing plates using these polymers are still insufficient and also it causes contamination during printing process.
Japanese patent application, J. P. KOKAI No. Sho 63-226641 discloses a positive-working photosensitive composition comprising as a binder an alkaline-soluble polymer having active imino group, which shows improved film-forming property, adhesiveness to substrate and abrasion resistance.
But, usually a developer consists of alkaline water and is used repeatedly. Thus, alkaline content in a developer, after it was used to develop many plates for a long time, may be decreased to result in deterioration of developability of the developer compared with a fresh developer (that is, it may take a longer time to develop a plate by a used developer than that by a fresh one). Also, precipitates are often observed in such a used developer. Thus, still it is necessary to provide a photosensitive composition which provides a lithographic printing plate that can be developed in a short time even with a used developer. Also, it is necessary to provide a photosensitive composition which can be suitably used under a wide development condition.
SUMMARY OF THE INVENTION
An object of the present invention is to provide a photosensitive composition useful for preparing a presensitized plate for a lithographic printing plate which can be developed with an aqueous alkaline developer and shows good abrasion resistance and printing durability.
Another object of the present invention is to provide a photosensitive composition useful for preparing a presensitized plate for a lithographic printing plate which shows good chemical resistance and shows good printing durability when it is printed using UV ink without burning treatment.
Still another object of the present invention is to provide a photosensitive composition useful for preparing a presensitized plate for a lithographic printing plate which shows wide latitude under development condition and no contamination during printing process.
Yet another object of the present invention is to provide a photosensitive composition useful for preparing a presensitized plate for a lithographic printing plate which can be quickly developed and shows wide latitude in development even when it is developed with a used developer.
It is a further object of the present invention to provide a photosensitive composition which shows good adhesiveness to the substrate and good solubility to an organic solvent and provides flexible film.
The inventors of the present invention studied various composition of vinyl copolymers and found that the above-described problems can be solved by a positive-working photosensitive composition comprising a vinyl polymer compound which is insoluble in water and soluble in an aqueous alkaline solution and o-naphthoquinonediazide compound, wherein said vinyl polymer compound is a copolymer comprising at least one monomer unit derived from (A) a monomer compound having an alkaline-soluble group and at least one monomer unit derived from (B) (meth)acrylate having poly(oxyalkylene) chain, to thus accomplish the present invention.
Namely, the present invention is a photosensitive composition comprising a vinyl polymer compound which is insoluble in water and soluble in an aqueous alkaline solution, wherein said vinyl polymer compound is a copolymer comprising at least one monomer unit derived from the following monomer compound (A) and at least one monomer unit derived from the following monomer compound (B).
(A) a compound having an alkaline-soluble group, represented by the following general formulation (I), (II) or (III):
(wherein, X represents —O— or —NR
3
—; R
1
represents —H or —CH
3
; R
2
represents single bond or bivalent organic group; Y represents arylene group; Z represents —OH, —COOH, —SO
2
NHR
4
, —NHSO
2
R
5
, —CONHSO
2
R
6
, —SO
2
NHCOR
7
, —NHCONHSO
2
R
8
, —SO
2
NHCONHR
9
, —CONHSO
2
NHR
10
, —NHSO
2
NHCOR
11
, —SO
2
NHSO
2
R
12
, —COCH
2
COR
13
, —OCONHSO
2
R
14
, or SO
2
NHCOOR
15
; n represents 0 or 1, but when R
2
is single bond and Z is —OH, n is 1; m is an integer of 1 or higher; R
3
represents hydrogen atom or optionally substituted C1-12 alkyl group, cycloalkyl group, aryl group or aralkyl group; R
4
, R
9
, R
10
represents hydrogen atom or optionally substituted C1-12 alkyl group, cycloalkyl group, aryl group or aralkyl group; R
5
, R
6
, R
7
, R
8
, R
11
, R
12
, R
13
, R
14
, and R
15
each represents optionally substituted C1-12 alkyl group, cycloalkyl group, aryl group or aralkyl group).
[wherein A represents hydrogen atom, halogen atom or alkyl group; B represents single bond, alkylene group, phenylene group, substituted alkylene group or substituted phenylene group;
X
1
represents
X
2
represents
(wherein, R represents optionally substituted alkyl group, cycloalkyl group, phenyl group, or naphthyl group).]
(wherein, E and E′ each represents hydrogen atom, halogen atom, alkyl group or phenyl group; F and F′ each separately represents single bond, alkylene group or substituted alkylene group;
X
3
and X
4
each represents
(B)(meth)acrylate
Fujita Kazuo
Tan Shiro
Burns Doane , Swecker, Mathis LLP
Chu John S.
Fuji Photo Film Co. , Ltd.
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