Photosensitive composition comprising a diazonium compound and a

Details Photosensitive composition comprising a diazonium compound and a Photosensitive composition comprising a diazonium compound and a

1991-09-05

1994-06-14

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430175, 430176, 430302, 430906, 522 32, G03F 7021, G03C 177

Patent

active

053209281

ABSTRACT:
A photosensitive composition comprising a sensitizing amount of light-sensitive diazonium compound and a polyurethane resin binder in an amount sufficient to improve physical property of the composition, wherein said polyurethane resin has at least one group selected from a phosphonic acid group, a phosphoric acid group and ester groups thereof in an amount sufficient to improve adhesion to a support. The photosensitive composition of the present invention provides an excellent adhesion to a support, an excellent developability with an aqueous alkali developer, and a high printing durability.

REFERENCES:
patent: 3607289 (1971-09-01), Keberle et al.
patent: 3660097 (1972-05-01), Mainthia
patent: 3754972 (1973-08-01), de Majistre et al.
patent: 3867147 (1975-02-01), Teuscher
patent: 3867351 (1975-02-01), Juna et al.
patent: 4289838 (1981-09-01), Rowe et al.
patent: 4337307 (1982-06-01), Neubauer
patent: 4408532 (1983-10-01), Incremona
patent: 4544466 (1985-10-01), Lindstrom
patent: 4732840 (1988-03-01), Hasegawa
patent: 4801527 (1989-01-01), Takamiya et al.
patent: 4822715 (1989-04-01), Shoji et al.
patent: 4840868 (1989-06-01), Pawlowski et al.
patent: 4859562 (1989-08-01), Pawlowski et al.
patent: 4877711 (1989-10-01), Aoai et al.
patent: 4950582 (1990-08-01), Aoai et al.
patent: 4963693 (1990-10-01), Sato et al.
patent: 4983491 (1991-01-01), Aoai et al.
patent: 5112743 (1992-05-01), Kamiya et al.
patent: 5187040 (1993-02-01), Mueller-Hess et al.
patent: 5254432 (1993-10-01), Aoai

Affiliated with

Also associated with

Rating

Photosensitive composition comprising a diazonium compound and a does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive composition comprising a diazonium compound and a, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive composition comprising a diazonium compound and a will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1248420