Photosensitive composition, compound for use in the...

Organic compounds -- part of the class 532-570 series – Organic compounds – Unsubstituted hydrocarbyl chain between the ring and the -c-...

Reexamination Certificate

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C430S270100, C430S920000, C430S921000, C430S914000, C430S919000, C540S584000, C540S604000, C548S443000, C548S475000, C548S574000, C560S044000, C544S104000, C544S146000, C544S106000, C522S031000, C522S050000, C522S059000

Reexamination Certificate

active

07449573

ABSTRACT:
A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.

REFERENCES:
patent: 4329478 (1982-05-01), Behr
patent: 5627292 (1997-05-01), Armand et al.
patent: 5691458 (1997-11-01), Arnost et al.
patent: 6355633 (2002-03-01), Wrobel et al.
patent: 6841333 (2005-01-01), Lamanna et al.
patent: 2004/0087690 (2004-05-01), Lamanna et al.
patent: 1 270 553 (2003-01-01), None
patent: 2002-131897 (2002-05-01), None
patent: 2002-214774 (2002-07-01), None
patent: 2003-140332 (2003-05-01), None
patent: WO 02/42845 (2002-05-01), None
“Heat” from http://whatis.techtarget.com/, All Rights Reserved, Copyright 2000-2006, TechTarget.copied Sep. 29, 2006, 13 pages last updated Sep. 23, 2001.
Research Disclosure (1979), 180, 139-40 (No 18032)□□ Coden: RSDSBB; ISSN:0374-4353. 4 pages.
Registry Copyright 2006 ACS on STN □□RN 70795-21-0 Registry□□ED Entered STN: Nov. 16, 1984.
Blus, Kazimierz, “Synthesis and properties of acid dyes derived from 7-amino-1-hydroxynaphthalene-3-sulphonic acid,” Dyes and Pigments, vol. 41, Issues 1-2, (1999), pp. 149-157.

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