Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1993-11-29
1994-08-23
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430167, 430189, 430192, 430193, 430197, 430273, 430320, 430905, 430165, G03F 7023, G03F 7115
Patent
active
053406842
ABSTRACT:
A photosensitive composition contains a polyimide constituted by a repeating unit having a hydroxyl group and a repeating unit having a siloxane bond, or a repeating unit having a hydroxyl group, a repeating unit having a siloxane bond, and a repeating unit other than these two repeating units, and a photosensitive agent consisting of an ester compound or an amide-ester compound of naphthoquinonediazidesulfonic acid or benzoquinonediazidesulfonic acid. The photosensitive composition is used as a passivation film of a semiconductor device or a photoresist.
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Journal of Photopolymer Science and Technology, vol. 2 (1); H. Mochizuki et al; "Preparation and Properties of Positive Photosensitive . . . "; pp. 43-44.
Hayase Rumiko
Kihara Naoko
Mikogami Yukihiro
Oba Masayuki
Bowers Jr. Charles L.
Chu John S.
Kabushiki Kaisha Toshiba
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