Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-12-14
1996-10-22
Chu, John S. Y.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430175, 430176, 4302731, 4302811, 4302831, 4302841, 4302881, 430302, 430920, 430925, G03F 711, G03F 7021, G03F 7031
Patent
active
055675689
ABSTRACT:
A photosensitive composition comprising (A) an ethylenically unsaturated addition-polymerizable compound, (B) an aqueous alkali-soluble or swelling polymer which is capable of forming a film, (C) a photopolymerization initiator, (D) a negative-working diazo resin, and (E) a component which is soluble in a photosensitive solution, but floats on a surface of a photosensitive layer and is capable of forming an oxygen-intercepting layer during coating and drying is described. A photosensitive lithographic printing plate comprising a support coated with the above-described photosensitive composition and a matting layer provided thereon, wherein the surface of the matting layer has a micro pattern comprising (i) a portion which is coated with a composition comprising a copolymer containing at least one monomer unit having a sulfonic acid group and (ii) a portion which is uncoated with the composition is also descried.
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patent: 5080999 (1992-01-01), Imai et al.
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patent: 5153095 (1992-10-01), Kawamura et al.
Chu John S. Y.
Fuji Photo Film Co. , Ltd.
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