Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1992-07-31
1993-11-09
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430157, 430163, 430175, 430176, 430278, 430280, 430302, 430906, 430907, 430908, 430909, 430910, G03F 7021, G03C 154, G03C 177
Patent
active
052601617
ABSTRACT:
Disclosed is a photosensitive composition comprising a diazo resin and a polymeric compound containing a structural unit represented by the following formula (I) in the molecule: ##STR1## wherein J represents a divalent linking group and n is 0 or 1. Disclosed is also a photosensitive lithographic printing using the photosensitive composition.
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Bunya Shinichi
Katahashi Eriko
Matsubara Shinichi
Matsumura Toshiyuki
Uehara Masafumi
Bierman Jordan B.
Chu John S.
Konica Corporation
Mitsubishi Kasei Corporation
Schilling Richard L.
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