Photosensitive composition and photosensitive copying material p

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430165, 430192, 430270, 430906, G03C 160, G03C 1495

Patent

active

048897892

ABSTRACT:
A photosensitive composition which substantially comprises a binder which is insoluble in water and soluble in aqueous-alkaline solutions, a photosensitive 1,2-naphthoquinone-diazide or a photosensitive mixture comprised of a compound which splits off acid upon exposure to light and a compound containing at least one acid-cleavable C-O-C group, and a thermally crosslinking compound comprising a urea or urethane-formaldehyde condensation product is disclosed. Also disclosed is a copying material prepared from this composition. The material has a good shelf life and can be processed as a positive or negative-working material, and also according to the photocomposing method. For development customary developer solutions are used.

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DeForest, W. S., Photoresist Materials and Processes, McGraw-Hill Book Co., 1975, pp. 47-59.
W. Lengsfled, Farben und Lacke ("Dyes and Varnishes") 75, Nr. 11, 1969, Uber die Struktur butylierter Aminoplaste, pp. 1053-1065.
Houben-Weyl, Methoden der Organischen Chemie ("Methods of Organic Chemistry") 14/2 pp. 350-351, 379 (1963).

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