Photosensitive composition and pattern forming process using sam

Details Photosensitive composition and pattern forming process using sam Photosensitive composition and pattern forming process using sam

1986-04-16

1988-04-05

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Producing cathode-ray tube or element thereof

Using specified radiation-sensitive composition other than a...

430144, 430178, G03C 534, G03C 518, G03F 708, G03F 726

Patent

active

047358807

ABSTRACT:
A photosensitive composition comprising (1) at least one diazonium compound selected from among salts and double salts of diazonium ions represented by the general formulas: ##STR1## wherein A stands for a substituent selected from among ##STR2## wherein R.sub.1 and R.sub.2 each stand for an alkyl or benzyl group with the proviso that the total number of carbon atoms of R.sub.1 and R.sub.2 is 8 to 16, and (2) at least one nitrate selected from the group consisting of calcium nitrate and magnesium nitrate and a pattern forming process using such a composition.
This composition gets sticky upon exposure to light.

REFERENCES:
patent: 3650750 (1972-03-01), Iwata et al.
patent: 3997344 (1976-12-01), Schlesinger et al.
patent: 4269918 (1981-05-01), Nonogaki et al.
patent: 4273842 (1981-06-01), Nonogaki et al.
patent: 4370401 (1983-01-01), Winslow et al.
patent: 4377630 (1985-03-01), Morishita et al.
patent: 4537851 (1985-08-01), Nonogaki et al.
Windheltz, M., Ed., The Merck Index, 9th Ed., 1976, pp. 213, 737 and 738.

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