Photosensitive composition and method of forming a resist patter

Details Photosensitive composition and method of forming a resist patter Photosensitive composition and method of forming a resist patter

1987-03-09

1989-05-09

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430169, 430176, 430190, 430192, 430193, 430197, 430270, 430323, 430325, 430326, G03C 1495, G03C 160, G03C 172, G03F 726

Patent

active

048289582

ABSTRACT:
The photosensitive composite of the present invention is obtained by including a nonsubstitutional or substitutional benzyl radical in the phenol side chain of polyvinylphenol. The photosensitive composites have not only excellent heat resistivity, RIE resistivity, and resolving power but also have a wide tolerance for the variations in the development temperature and developer concentration at the time of development. Therefore, it is possible to obtain resist patterns with fine structure.

REFERENCES:
patent: 3869292 (1975-03-01), Peters
patent: 4439516 (1984-03-01), Cernigliaro et al.
patent: 4603101 (1986-07-01), Crivello et al.
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4732836 (1988-03-01), Potuin et al.
patent: 4732837 (1988-03-01), Potuin et al.
patent: 4737437 (1988-04-01), Gutsell et al.
English Abstract of Japanese Publication 50-95002, published 7/29/85.

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